… Nanoimprint lithography has emerged attractively due to its simple process steps, high throughput, high resolution and low cost and become one of the commercial platforms for nanofabrication. Nanoimprinting can not only create resist patterns, as in lithography, but can also imprint functional device structures in various polymers, which can lead to a wide range of applications in electronics, photonics, data storage, and biotechnology. This chapter provides a general description of the two prominent types of NIL: thermal and UV‐NIL, a discussion of the inkjet technology used and requirements, and the review of successful applications using NIL with inkjet printheads. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication. Both the techniques use a polymer resist preplaced on a substrate that is pressed against a mold to … Nanoimprint lithography (NIL) is a material processing tool with a rapidly expanding scope of applications. REVIEW ARTICLE Nanoimprint lithography: An old story in modern times? An excellent review of these alternative microfabrication technologies, their applications, and limitations has been published in Heckele and Schomburg (2004). Yuli Vladimirsky, in Vacuum Ultraviolet Spectroscopy, 1999. In this review paper, we will discuss three types of nanoimprint lithography methods which are based on dif-ferent moduli of molds: so mold, hard mold, and hybrid … Hillmer H, Woidt C, Istock A, Kobylinskiy A, Nguyen DT, Ahmed N, Brunner R, Kusserow T. Role of Nanoimprint Lithography for Strongly Miniaturized Optical Spectrometers. 39:155-180 (Volume publication date 4 August 2009) Nanoimprint lithography (see figure) is an emerging lithographic technique for high‐throughput patterning of polymer nanostructures at high resolutions and low costs. NanoImprint is a generic technology involving various approaches but keeping a common goal: the use of a stamp or mold to transfer a 2D or 3D pattern onto a surface or in a material’s thickness. Nanoimprint lithography is a generic term for nano-scale pattern transfer using embossing techniques. We describe the early development and fundamental principles underlying the two most commonly used types of NIL, thermal and UV, and contrast them with conventional photolithography methods used in the semiconductor industry. Nanoimprint lithography is a generic term for … One wants to know much more details, please refer them. However, the current nanoimprint lithography is a type of an additive nanofabrication method that has limited potential due to its restricted template-dependent innate character. Schematics of thermoplastic nanoimprint lithography (left) and photo nanoimprint lithography (right). Nanoimprint lithography presents a new strategy for preparing uniform nanostructures with predefined sizes and shapes and has the potential for developing nanosized drug delivery systems. Nanomaterials. Nanoimprint lithography is a relatively new area of study in nanotechnology. Helmut Schift 26. Higher resolution patterning can be achieved with nanoimprint lithography than with light diffraction or beam scattering in photoresists. ... Nanoimprint lithography was used to create narrow lines of thin Au by placing nanometer-sized Au droplets at position-controlled sites (Fig. Nanoimprint lithography (NIL), a molding process, can replicate features <10 nm over large areas with long-range order. • Actuation of smart, shape changing materials via NIL imparts dynamic surface behaviors.. NIL-based processing of semi-crystalline polymers facilitates improved performance in solar cell, field effect transistor, and ferroelectric memory devices. It is essentially a 3D process, because it replicates various stamp topographies by 3D displacement of material and takes advantage of the bending of stamps while the mold cavities are filled. The Advantages of Nanoimprint Lithography for Semiconductor Device Manufacturing Toshiya Asano 1, Keita Sakai 1, Kiyohito Yamamoto 1, Hiromi Hiura 1, Takahiro Nakayama 1, Tomohiko Hayashi 1, Yukio Takabayashi 1, Takehiko Iwanaga 1, Douglas J. Resnick 2 1Canon Inc., 20-2, Kiyohara-Kogyodanchi, Utsunomiya-shi, Tochigi 321-3292 Japan 2Canon Nanotechnologies Inc., 1807 West Braker Lane, Bldg. Selection and peer-review under responsibility of the Organizing Committee of GCMM 2014 1388 N. Vigneswaran et al. Abstract Nanoimprint lithography (NIL) is more than a planar high-end technology for the patterning of wafer-like substrates. Schematic steps of the nanoimprint lithography process used for fabricating gold nanopost-shell arrays. Abstract Nanoimprint lithography (NIL) is more than a planar high-end technology for the patterning of wafer-like ... tional lithography. In this work, we report highly reproducible one-step printing of metal nanocubes. Nanoimprint lithography is a method of fabricating nanometer scale patterns. A review Helmut Schifta Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland